LABORATORY FOR SPECTROPHOTOMETRIC ANALYSIS
This laboratory is able to do not just spectrophotometric but classical chemical analyzes for physical geographical researches and diffuse reflectance measurements also. The diffuse reflectance (DRS) analysis for homogeneous materials has long history but for sediments and soils it is relatively new. We are involved in research methodology development using this technology. The laboratory instrumentation unit is equipped with two spectrophotometer, a photometer suitable for field application, a flame photometer and an atomic absorption spectrometer.
Shimadzu UV 3600 with LISR 3100 sphere attachment (2012)
The instrument is mainly used for high-precision spectroscopic measurements, but it can be used for traditional photometric-based chemical studies and for example, for soil color analysis studies.
Wavelength range – in transmission mode: 185 nm – 3300 nm
Wavelength range –in reflectance mode: 240 nm – 2400 nm
Reflectance measurement: LISR3100 Integrating Sphere (BaSO4)
Number of detectors: 3 (InGaAs, PbS , and PMT)
Resolution: 0.1 nm
Light sources: Tungsten (Vis-NIR), Deuterium (UV)
Spectral bandwidth:
8 steps in ultraviolet and visible regions: 0.1, 0.2, 0.5, 1, 2, 3, 5, 8 nm
10 steps in near-infrared region: 0.2, 0.5, 1, 2, 3, 5, 8, 12, 20, 32 nm
Wavelength sampling pitch: 0.01 – 5 nm
Wavelength accuracy: UV/VIS: ±0.2 nm, NIR: ±0. 8 nm
Wavelength repeat accuracy:
Ultraviolet and visible regions: Within ± 0.08 nm
Near-infrared region: Within ± 0.32 nm
Stray light
< 0.00008% (220 nm, NaI)
0.00005% (340 nm, NaNO2)
0.0005% (1420 nm, H2O)
0.005% (2365 nm, CHCl3)
Photometric range: -6 to 6 Abs
Noise
0.00005 Abs max. (500 nm)
0.00008 Abs max. (900 nm)
0.00003 Abs max. (1500 nm)
Slit width: 2nm, (RMS value at 1 sec. response)
Photometric system: double beam
Shimadzu UV 1240 (2013)
The instrument is mainly used for photometric measurements but it is also suitable for spectroscopic measurements.
Wavelength range: 190 – 1100 nm
Number of detectors: 1 (Silicon photodiode)
Spectral bandwidth: 5nm
Display wavelength: selectable wavelength 0.1nm step (1nm step in spectrum mode)
Wavelength accuracy: ± 1.0nm
Wavelength repeat accuracy: ± 0.3nm
Light sources:
VIS: halogen (WI)
UV: deuterium (D2)
Scattered light: smaller than 0.05% (220.0nm NaI, 340.0nm NaNO2 & UV-39)
Measurement method: single beam measurement
Photometric range: -0.3~3.0 Abs
Transmittancy: 0.0~200%
Photometric repeat accuracy: ± 0.002 Abs (at 1.0 Abs)
Baseline stability: smaller than ± 0.001 Abs/h (after 2 hr warm-up)
Baseline flatness: smaller than ± 0.010 Abs (after 1 hr warm-up, at 1100~200nm)
Noise level: smaller than 0.002 Abs, (peak to peak), smaller than 0.0005 Abs, RMS
Baseline correction: auto correction with the computer memory
Photometric system: single beam
Merck SQ118 (1996)
VIS photometer for field use.
Sherwood 410 Industrial (2014) flame photometer
Sensitivity: Na <0.5 ppm, K <0.5 ppm, Li 5 ppm, Ca 5 ppm, Ba 200 ppm
Specificity: Na, K & Li interference is <0.5% value of Na, K, Li, Ca, Ba concentration.
Linearity: better than 2% (middle range Na=3ppm, K=3ppm, or Li=5ppm)
Drift: (30 min after warm-up): better than 2% per hour (Na=10ppm)
Reproducibility: < 1 % CV (20 measurement, Na and K=10ppm).
Detection limit: <20 ppb Na and K